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dc.contributor.author김주희-
dc.contributor.author최형수-
dc.contributor.author조영상-
dc.contributor.author이경옥-
dc.contributor.author김경숙-
dc.contributor.author최광진-
dc.contributor.authorSoon T. Hwang-
dc.contributor.authorIlwun Shim-
dc.date.accessioned2015-12-02T07:57:36Z-
dc.date.available2015-12-02T07:57:36Z-
dc.date.issued199605-
dc.identifier.citationv. 11, no. 5, 1051-1060-
dc.identifier.issn0884-2914-
dc.identifier.other6321-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/24480-
dc.publisherJournal of materials research-
dc.subjectbisethylacetoacetato Cu(II)-
dc.titleBisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization.-
dc.typeArticle-
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