Structural and electrical properties of Al//2O//3 thin films on p-Si grown by low-pressure metalorganic chemical vapor deposition.

Title
Structural and electrical properties of Al//2O//3 thin films on p-Si grown by low-pressure metalorganic chemical vapor deposition.
Authors
염상섭윤영수Chayeon KimT. W. KimW. N. KangI. S. YangY. J. Wee김성태
Keywords
thin films; Al//2O//3; MOCVD
Issue Date
1993-01
Publisher
Applied surface science
Citation
v. 65/66, 854-857
URI
http://pubs.kist.re.kr/handle/201004/24770
Appears in Collections:
KIST Publication > Article
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