Effects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films.

Title
Effects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films.
Authors
김용태민석기홍종성염상섭홍치유김충기
Keywords
thin films; SiH//4; CVD
Issue Date
1990-01
Publisher
Journal of the Korean Physical Society
Citation
v. 23, 518-522
URI
http://pubs.kist.re.kr/handle/201004/24920
Appears in Collections:
KIST Publication > Article
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