Fabrication and characterization of Pt/SrBi2Ta2O9(SBT)/CeO2/Si metal ferroelectric insulator semiconductor field effect transistor (MFISFET) memory by using the inductively coupled plasma reactive ion etching (ICP RIE) process

Title
Fabrication and characterization of Pt/SrBi2Ta2O9(SBT)/CeO2/Si metal ferroelectric insulator semiconductor field effect transistor (MFISFET) memory by using the inductively coupled plasma reactive ion etching (ICP RIE) process
Authors
심선일박정호권영석김성일김용태
Keywords
ferroelectric; FRAM; MFISFET; ICP; RIE; etching
Issue Date
2003-11
Publisher
APHYS2003-11
URI
http://pubs.kist.re.kr/handle/201004/25296
Appears in Collections:
KIST Publication > Conference Paper
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