Improvement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer deposition

Title
Improvement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer deposition
Authors
심현상전형탁김성일김용태
Issue Date
2003-11
Publisher
The 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Mate
Citation
, 211-211
URI
http://pubs.kist.re.kr/handle/201004/25302
Appears in Collections:
KIST Publication > Conference Paper
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