Efficient Incorporation of the Ti Component with a Novel Titanium Diolate Complex in the CVD of Ba1-xSrxTiO3 Thin Films

Title
Efficient Incorporation of the Ti Component with a Novel Titanium Diolate Complex in the CVD of Ba1-xSrxTiO3 Thin Films
Authors
이종승홍성호우경자이완인
Keywords
CVD(chemical vapor deposition); Ti precursor; thin film; metal-organic; BST film; Ti component
Issue Date
2004-03
Publisher
Chemical Vapor Deposition
Citation
VOL 10, NO 2, 67-69
URI
http://pubs.kist.re.kr/handle/201004/25523
ISSN
0948-1907
Appears in Collections:
KIST Publication > Article
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