Plasma source ion implantation using high-power pulsed RF plasma

Title
Plasma source ion implantation using high-power pulsed RF plasma
Authors
한승희이연희김영우김영수천혜진이정혜
Keywords
Pulsed plasma; PSII; Plasma; Ion implantation; RF amplifier
Issue Date
2004-08
Publisher
Surface and Coatings Technology
Citation
VOL 186, NO 1-2, 177-181
URI
http://pubs.kist.re.kr/handle/201004/26421
ISSN
0257-8972
Appears in Collections:
KIST Publication > Article
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