Plasma-enhanced chemical vapor deposition of silicon oxynitride films and their gas barrier properties

Title
Plasma-enhanced chemical vapor deposition of silicon oxynitride films and their gas barrier properties
Authors
심준호곽순종
Keywords
silicon oxynitride; plasma enhanced chemical vapor deposition; gas barrier; plastic substrate
Issue Date
2004-08
Publisher
Polymer Processing Society
URI
http://pubs.kist.re.kr/handle/201004/26891
Appears in Collections:
KIST Publication > Conference Paper
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