Selective etching process of SrBi2Ta2O9 and CeO2 for self-aligned ferroelectric gate structure

Title
Selective etching process of SrBi2Ta2O9 and CeO2 for self-aligned ferroelectric gate structure
Authors
심선일권영석김성일김용태박정호
Issue Date
2004-08
Publisher
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Citation
VOL 22, NO 4, 1559-1563
URI
http://pubs.kist.re.kr/handle/201004/26978
ISSN
0734-2101
Appears in Collections:
KIST Publication > Article
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