Reproducible resistive switching in nonstoichiometric nickel oxide films grown by rf reactive sputtering for resistive random access memory applications

Title
Reproducible resistive switching in nonstoichiometric nickel oxide films grown by rf reactive sputtering for resistive random access memory applications
Authors
박재완박종완김달영이전국
Keywords
Resistive RAM; Nickel oxide; reactive rf sputtering; nonstoichiometry
Issue Date
2005-09
Publisher
Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society
Citation
VOL 23, NO 5, 1309-1313
URI
http://pubs.kist.re.kr/handle/201004/27737
ISSN
0734-2101
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE