Pulse plasma assisted atomic layer deposition of W-C-N thin films for Cu interconnects

Title
Pulse plasma assisted atomic layer deposition of W-C-N thin films for Cu interconnects
Authors
김용태박지호
Issue Date
2005-10
Publisher
Physica status solidi. A, Applied research
Citation
VOL 202, NO 14, R164-R166
URI
http://pubs.kist.re.kr/handle/201004/28378
ISSN
0031-8965
Appears in Collections:
KIST Publication > Article
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