Complete Prevention of Edge Bead Effect in Thick Photoresist for Cost-effective MEMS Process

Title
Complete Prevention of Edge Bead Effect in Thick Photoresist for Cost-effective MEMS Process
Authors
이병철장성일윤준보
Keywords
Edge bead; Edge extension chuck; LIGA; MEMS; Photolithography; Spin coating; Thick photoresist
Issue Date
2006-04
Publisher
제 8회 한국 MEMS 학술대회 논문집(2006년 4월 6-8일)
Citation
, 528-532
URI
http://pubs.kist.re.kr/handle/201004/29874
Appears in Collections:
KIST Publication > Conference Paper
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