Fabrication of Tungsten Nano Dots by Using Diblock Copolymer as a Mask

Title
Fabrication of Tungsten Nano Dots by Using Diblock Copolymer as a Mask
Authors
김성일강길범김영환박민철김용태이창우
Keywords
copolymer lithography; nano dot; diblock copolymer
Issue Date
2006-11
Publisher
Advanced Semiconductor Processes and Equipments 2006
Citation
, 91-93
URI
http://pubs.kist.re.kr/handle/201004/30080
Appears in Collections:
KIST Publication > Conference Paper
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE