Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films

Title
Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films
Authors
Wang, AY이광렬Sun, CWen, LS
Issue Date
2006-09
Publisher
Journal of materials science & technology
Citation
VOL 22, NO 5, 599-604
URI
http://pubs.kist.re.kr/handle/201004/30867
ISSN
1005-0302
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE