Inner Trench Type Tungsten Nano Dot Arrays Patterned by Using Diblock Copolymer Templates and Selective Ion Etching

Title
Inner Trench Type Tungsten Nano Dot Arrays Patterned by Using Diblock Copolymer Templates and Selective Ion Etching
Authors
강길범김성일김영환박민철김용태이창우
Keywords
diblock copolymer; copolymer lithography; reactive ion etching; nano dot; nanotemplate
Issue Date
2006-06
Publisher
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Citation
VOL 2, 599-602
URI
http://pubs.kist.re.kr/handle/201004/31332
Appears in Collections:
KIST Publication > Conference Paper
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE