DSpace at KIST: Effect of Thermal Annealing on the Formation of Preferential c-Axis Orientation and an Interfacial Layer for ZnO Thin Films Grown on an n-Si (001) Substrate

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Effect of Thermal Annealing on the Formation of Preferential c-Axis Orientation and an Interfacial Layer for ZnO Thin Films Grown on an n-Si (001) Substrate

Title: Effect of Thermal Annealing on the Formation of Preferential c-Axis Orientation and an Interfacial Layer for ZnO Thin Films Grown on an n-Si (001) Substrate

Authors: J. M. Yuk; J. W. Shin; J. Y. Lee; D. I. Son; J. H. Jung; T. W. Kim; J. Y. Kim; 최원국

Issue Date: 2007-03

Publisher: Journal of the Korean Physical Society

Citation: VOL 50, NO 3, 608-611

URI: http://pubs.kist.re.kr/handle/201004/32662

ISSN: 0374-4884

Appears in Collections:: KIST Publication > Article

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