Effect of Oxygen Pressure on the Electrical Properties of Bi5Nb3O15 Films Grown by RF Magnetron Sputtering

Title
Effect of Oxygen Pressure on the Electrical Properties of Bi5Nb3O15 Films Grown by RF Magnetron Sputtering
Authors
조경훈최창학최주영송태근남산강종윤윤석진김종희
Keywords
Bi5Nb3O15 (B5N3); high dielectric constant; leakage current density; metal-insulator-metal (MIM) capacitor; tmperature coefficient of capacitance (TCC); voltage coefficient of capacitance (VCC)
Issue Date
2008-09
Publisher
IEEE Electron Device Letters
Citation
VOL 29, NO 9, 984-987
URI
http://pubs.kist.re.kr/handle/201004/33405
ISSN
0741-3106
Appears in Collections:
KIST Publication > Article
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