Silicon On Insulator (SOI) Wafer Development using Plasma Source Ion Implantation (PSII) Technology

Title
Silicon On Insulator (SOI) Wafer Development using Plasma Source Ion Implantation (PSII) Technology
Authors
정승진이성배한승희임상호
Keywords
silicon on insulator; buried oxide; SPIMOX; PSII
Issue Date
2008-01
Publisher
대한금속 . 재료학회지; Journal of the Korean Institute of Metals and Materials
Citation
VOL 46, NO 1, 39-43
URI
http://pubs.kist.re.kr/handle/201004/34748
ISSN
1738-8228
Appears in Collections:
KIST Publication > Article
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