Electrochemical characteristics of amorphous carbon coated silicon electrodes
- Electrochemical characteristics of amorphous carbon coated silicon electrodes
- O. M. Vovk; 나병기; 조병원; 이중기
- Fullerene C60; Lithiium secondary batteries; r.f. plasma sputtering; UV-vis spectra; Raman Spectra; carbon film; Anode of Lithium Secondary Batteries
- Issue Date
- The Korean journal of chemical engineering
- VOL 26, NO 4, 1034-1039
- The properties of carbon films deposited by the radio frequency plasma sputtering of a fullerene C60 target
were investigated to elucidate the dependence on the plasma power. A radio frequency argon plasma power ranging
from 50 to 300W at a pressure of 1.3 Pa was applied for sputtering. This corresponds to a self-bias potential on the
target ranging from −95 to −250 V and a maximum argon ion energy ranging from 240 to 575 eV. The analysis of the G
and D peaks in the Raman spectra shows that the films are similar to tetragonal hydrogenated amorphous carbon annealed
at 600-1,000 oC. The electron band structure of the carbon films deposited by the sputtering of C60 depends on
the plasma power. The coating effect of these carbon films on the capacity performance of the silicon film electrode
of lithium secondary batteries was significant in our experimental range. An electrochemical test revealed that such
carbon thin film on the silicon electrode plays an important role in mitigating the capacity fading during the charge
and discharge processes. The test revealed that the film formed at a plasma power of 300 W is the most effective.
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