Gas Barrier Film with a Compositional Gradient Interface Prepared by Plasma Modification of an Organic/Inorganic Hybrid Sol-Gel Coat
- Gas Barrier Film with a Compositional Gradient Interface Prepared by Plasma Modification of an Organic/Inorganic Hybrid Sol-Gel Coat
- 곽순종; 전재호; 정의석
- gas barrier; flexible display; plasma modification; plastic substrate; poly(ether sulfone); silicon oxide
- Issue Date
- Langmuir : the ACS journal of surfaces and colloids
- VOL 25, NO 14, 8051-8055
- A high-performance gas barrier film has been prepared using a simple oxygen plasma treatment of an organic/
inorganic hybrid sol-gel coat on a poly(ether sulfone) substrate. The gas barrier layer formed from the plasma
treatment was an inorganic silicon oxide (SiOx) having a compositional gradient interface with the sol-gel coat, where
the chemical compositions changed gradually from inorganic to organic structure at the interface. The minimum
attained oxygen transmission rate (OTR) of the gas barrier layer was 0.2 cm3/(m2 day), which is superior or comparable
to that of the gas barrier layer prepared by plasma-enhanced chemical vapor deposition (PECVD) or sputtering. Lowtemperature
oxygen plasma combustion of alkyl groups existing in the sol-gel coat is considered to be the major
reaction for the formation of the SiOx gas barrier layer, where oxygenated carbon compounds and hydrogen were the
main volatile components as verified by the analysis of optical emission spectroscopy. Plasma treatment time necessary
to attain a high-performance SiOx gas barrier layer decreased with increasing RF plasma power. In a dynamic bending
test, the gas barrier film preserved the initial gas barrier properties without any formation of film cracks or delamination.
The compositional gradient at the interface between the gas barrier and the sol-gel coat is considered to provide a stressrelieving
effect at the interface.
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