Synthesis and Characterization of Fluoro-co-Phenyl Silsesquioxane (FCPSQ) for Low-k Dielectric Materials

Title
Synthesis and Characterization of Fluoro-co-Phenyl Silsesquioxane (FCPSQ) for Low-k Dielectric Materials
Authors
최승석이희승김은경백경열최동훈황승상
Keywords
silsesquioxane; fluorine polymer; dielectric material
Issue Date
2009-08
Publisher
KJF International Conference on Organic Materials for Electronics and Photonics
Citation
, P231
Abstract
A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2,tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H2O/THF mixture solvent at 25 °C. Chemical compositions, molecular weights, and structures of the obtained PFCPSQs were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.
URI
http://pubs.kist.re.kr/handle/201004/35768
Appears in Collections:
KIST Publication > Conference Paper
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