A study on characteristics of hydrogenated amorphous/nanocrystalline silicon thin film on porous anodic alumina substrate

Title
A study on characteristics of hydrogenated amorphous/nanocrystalline silicon thin film on porous anodic alumina substrate
Authors
김상옥Aliaksandr KHODIN이중기
Keywords
Hydrogenated amorphous silicon; Porous anodic alumina; Chemical vapor deposition; Textured surfaces; Raman spectra; X-ray diffraction
Issue Date
2009-06
Publisher
International symposium on Function Materials (ISFM2009)
Abstract
Hydrogenated silicon thin films were deposited by Electron Cyclotron Resonance - Chemical Vapor Deposition(ECR-CVD) method on the textured substrate. Textured substrate was used to scatter light at interface, which lead to enhance photon absorption and the stabilized efficiency[1]. Chemical vapor deposition methods enable to coat convoluted shape of the textured surface. In the present study, microwave power and the H2/SiH4 feeding ratio were employed as major process parameters to control the degree of crystallinity of the silicon films[2]. Raman scattering studies were carried out to analyze the crystalline volume fraction of thin Si layer. The structural properties of these films were investigated by x-ray diffraction(XRD), and scanning electron microscopy(SEM). The optical properties of the formed film were characterized by UV-Vis spectroscopy
URI
http://pubs.kist.re.kr/handle/201004/35776
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KIST Publication > Conference Paper
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