Crystallization behavior of amorphous silicon thin film deposited by DC/RF magnetron sputtering with substrate bias

Title
Crystallization behavior of amorphous silicon thin film deposited by DC/RF magnetron sputtering with substrate bias
Authors
이승민성태연박종극
Keywords
a-Si; sputtering; crystallization; thin film
Issue Date
2009-09
Publisher
AEPSE2009
URI
http://pubs.kist.re.kr/handle/201004/35912
Appears in Collections:
KIST Publication > Conference Paper
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE