Physical and Microstructural Properties of NiO- and Ni-YSZ Composite Thin Films Fabricated by Pulsed-Laser Deposition at T≤700 ℃

Title
Physical and Microstructural Properties of NiO- and Ni-YSZ Composite Thin Films Fabricated by Pulsed-Laser Deposition at T≤700 ℃
Authors
노호성박종성손지원이헌이종호이해원
Keywords
Micro-SOFC; PLD; NiO- and Ni-YSZ Nano-Composite
Issue Date
2009-11
Publisher
Journal of the American Ceramic Society
Citation
VOL 92, NO 12, 3059-3064
Abstract
The physical and microstructural properties of NiO- and Ni-YSZ composite thin films deposited by pulsed-laser deposition have been investigated for nanoporous anode electrodes of SOFC applications. An NiO-YSZ thin film which was deposited at room temperature and postannealed at 700°C exhibited a fine porous structure, but electrical conduction was not detected when reduced. On the other hand, 700°C-deposited NiO-YSZ films showed appropriate crystallinity and exhibited electrical conductivity after reduction; however, massive Ni agglomeration occurred and porous structures were not obtained as intended. It was shown that as the Ni content and the reduction temperature increase, the coarsening becomes much more severe.
URI
http://pubs.kist.re.kr/handle/201004/36002
ISSN
0002-7820
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KIST Publication > Article
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