Preparation of silicon thin film by plasma enhanced chemical vapor deposition as a high capacity anode for lithium polymer batteries
- Preparation of silicon thin film by plasma enhanced chemical vapor deposition as a high capacity anode for lithium polymer batteries
- 이중기; 김정섭; 변동진
- PECVD; Silcon; Anode; LIB
- Issue Date
- 216th Electrocehmical society meeting
- The properties of semi-conductive silicon thin films (n-type and p-type silicon)
deposited by radio frequency coupled plasma enhanced chemical vapor deposition (rfpecvd)
on copper foil were studied using scanning electron microscopy (SEM), X-ray
photoelectron spectroscopy (XPS) and electrochemical measurements. The
charge/discharge tests revealed that the n-type silicon thin film electrode shows a stable
cyclic performance after the 40th cycle and it maintains a reversible specific capacity of
about 2500 mAh/g. The excellent electrochemical performance of the doped silicon
anode was attributed to the enhancement of its electrical conductivity, which was further
confirmed by impedance spectroscopy and surface analysis by XPS.
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- KIST Publication > Conference Paper
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