Preparation of silicon thin film by plasma enhanced chemical vapor deposition as a high capacity anode for lithium polymer batteries

Title
Preparation of silicon thin film by plasma enhanced chemical vapor deposition as a high capacity anode for lithium polymer batteries
Authors
이중기김정섭변동진
Keywords
PECVD; Silcon; Anode; LIB
Issue Date
2009-10
Publisher
216th Electrocehmical society meeting
Abstract
The properties of semi-conductive silicon thin films (n-type and p-type silicon) deposited by radio frequency coupled plasma enhanced chemical vapor deposition (rfpecvd) on copper foil were studied using scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and electrochemical measurements. The charge/discharge tests revealed that the n-type silicon thin film electrode shows a stable cyclic performance after the 40th cycle and it maintains a reversible specific capacity of about 2500 mAh/g. The excellent electrochemical performance of the doped silicon anode was attributed to the enhancement of its electrical conductivity, which was further confirmed by impedance spectroscopy and surface analysis by XPS.
URI
http://pubs.kist.re.kr/handle/201004/36004
Appears in Collections:
KIST Publication > Conference Paper
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