Surface analysis of fluorine-containing thin films fabricated by various plasma polymerization methods
- Surface analysis of fluorine-containing thin films fabricated by various plasma polymerization methods
- 김영수; 김강진; 이연희
- plasma polymerization; fluorine; surface analysis; Hydrophobic; ICP; CCP; PSII
- Issue Date
- Surface & coatings technology
- VOL 203, 3129-3135
- Plasma-polymerized fluorine-containing thin films were fabricated by five different plasma methods, viz.
inductively coupled plasma (ICP), pulsed-plasma (PP), capacitively coupled plasma (CCP), self-ignition plasma
(SIP), and plasma source ion implantation/inductively coupled plasma (PSII/ICP). Octafluoropropane (C3F8) was
mixed with acetylene (C2H2) to investigate the effect of different plasma techniques on the films. The properties of
the plasma polymers, viz. hydrophobic properties, binding structure, deposition rate, and chemical composition,
varied considerably depending on the plasma polymerization method. The plasma-polymerized thin filmsmade by
the different methods were characterized using surface analytical instruments: field-emission scanning electron
microscope (FE-SEM), atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS), near-edge X-ray
absorption fine structure (NEXAFS), and time-of-flight secondary ion mass spectrometry (TOF-SIMS). Cross-section
images fromFE-SEMrevealed that the deposition rate of the polymerfilm in the case of using CCP plasmawas higher
while that for PSII/ICP and self-ignition plasma, respectively,was lower comparedwith the deposition rate of the ICP
and pulsed-plasma. The water contact angle measurement showed that the ICP and PSII/ICP techniques produced
more hydrophobic surfaces. XPS and TOF-SIMSanalyses indicated that the ICP and PSII/ICPmethods produced more
F-containing functional groups, especially CF2 and CF3 groups. Also, the NEXAFS results revealed that the ICP and
PSII/ICP techniques providemore fluorine species on the plasma polymer surface compared with other techniques.
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