Effect of UV-Assisted RTA on the Electrical Properties of (Ba,Sr)TiO3 Films for Low Temperature Embedding of Decoupling Capacitor

Title
Effect of UV-Assisted RTA on the Electrical Properties of (Ba,Sr)TiO3 Films for Low Temperature Embedding of Decoupling Capacitor
Authors
조광환강민규강종윤윤석진이영백김종희조봉희
Issue Date
2009-10
Publisher
Journal of the Electrochemical Society
Citation
VOL 156, NO 12, G230-G232
Abstract
Polycrystalline Ba0.4Sr0.6TiO3 (BST) thin films grown at 350°C with UV-assisted rapidly thermal annealing (RTA) showed a high-k value of 183 at 100 kHz. The 100 nm thick BST film with UV-assisted RTA exhibited a high capacitance density of 16.2 fF/µm2 and a low dissipation factor of 0.48% at 100 kHz with a low leakage current density of 1×10−8 A/㎠ at 0.5 MV/cm. The quadratic and linear voltage coefficients of capacitances of the BST film with UV-assisted RTA were −155 ppm/V2 and 231 ppm/V, respectively. All these make the BST decoupling capacitor very suitable for use in radio-frequency circuits and mixed-signal integrated circuits
URI
http://pubs.kist.re.kr/handle/201004/36453
ISSN
0013-4651
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KIST Publication > Article
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