Amorphous-Nanocrystalline Silicon Plasma Enhanced CVD Grown on Porous Alumina Substrate

Title
Amorphous-Nanocrystalline Silicon Plasma Enhanced CVD Grown on Porous Alumina Substrate
Authors
A. Khodin이중기김창삼김상옥
Keywords
amorphous silicon; thin film; CVD; alumina; nanocrystals; composite materials
Issue Date
2009-11
Publisher
2009 9th IEEE Conference on Nanotechnology
Citation
, 659-661
Abstract
The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2 – 4 nm diameter, as well as “bunches” of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures for photovoltaics, photonics and ionics.
URI
http://pubs.kist.re.kr/handle/201004/36578
ISSN
978-981-3
Appears in Collections:
KIST Publication > Conference Paper
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