Method of improving the quality of nanopatterning in atomic image projection electron-beam lithography

Title
Method of improving the quality of nanopatterning in atomic image projection electron-beam lithography
Authors
김현미이민현이효성위정섭임기필김기범
Keywords
TEM; patterning; AIPEL; 2E21060
Issue Date
2009-12
Publisher
Journal of Vacuum Science and Technology B
Citation
VOL 27, 2553-2557
Abstract
The authors demonstrated successful nanopatterning using a high resolution lattice image obtained by transmission electron microscopy (TEM) as a mask signal [H. S. Lee et al., Adv. Mater. (Weinheim, Ger.) 19, 4198 (2007)]. In this process, the quality of the patterning result is critically dependent on the lattice image, which, in turn, is critically dependent on the quality of the mask. It is often noted that the quality of the mask prepared by the conventional TEM sample preparation technique is far from perfect, which critically limits the quality of patterning. In this work, they first discuss the various origins of the noise signal generated by the mask and then introduce a special type of objective aperture (noise reduction aperture) to remove the noise signal. The effect of the noise reduction aperture, designed for the Si [110] zone axis, is experimentally demonstrated.
URI
http://pubs.kist.re.kr/handle/201004/36948
ISSN
1071-1023
Appears in Collections:
KIST Publication > Article
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