Characteristics of ZnO:Al thin films co-doped with hydrogen and fluorine

Title
Characteristics of ZnO:Al thin films co-doped with hydrogen and fluorine
Authors
김용현정증현이경석박종극백영준성태연김원목
Keywords
Transparent conducting oxide; ZnO; Co-doping; Fluorine; Hydrogen
Issue Date
2010-06
Publisher
Applied surface science
Citation
VOL 256, NO 16, 5102-5107
Abstract
Fluorine and hydrogen co-doped ZnO:Al (AZO) films were prepared by radio frequency (rf) magnetron sputtering of ZnO targets containing 1 wt.% Al2O3 on Corning glass at substrate temperature of 150 ◦C with Ar/CF4/H2 gas mixtures, and the structural, electrical and optical properties of the as-deposited and the vacuum-annealed films were investigated. In as-deposited state, films with fairly low resistivity of 3.9–4×10−4 Ωcm and very low absorption coefficient below 900cm−1 when averaged in 400–800nm could be fabricated. After vacuum-heating at 300 ◦C, theminimumresistivity of 2.9×10−4 Ωcm combined with low absorption loss in visible region, which enabled the figure of merit to uplift as high as 4Ω−1, could be obtained for vacuum-annealed film. It was shown that, unlike hydrogenated ZnO films which resulted in degradation upon heating in vacuum at moderately high temperature, films with fluorine addition could yield improved electrical properties mostly due to enhanced Hall mobility while preserving carrier concentration level. Furthermore, stability in oxidizing environment could be improved by fluorine addition, which was ascribed to the filling effect of dangling bonds at the grain boundaries. These results showed that co-doping of hydrogen and fluorine into AZO films with low Al concentration could be remarkably compatible with thin film solar cell applications.
URI
http://pubs.kist.re.kr/handle/201004/37290
ISSN
0169-4332
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