Enhanced electrochromic properties of Ir-Ta oxide grown using a cosputtering system

Title
Enhanced electrochromic properties of Ir-Ta oxide grown using a cosputtering system
Authors
윤성욱유성종임주완박선하차인영성영은
Keywords
Electrochromic; Iridium; Tantalium; co-sputter
Issue Date
2010-05
Publisher
Journal of the Electrochemical Society
Citation
VOL 157, NO 7, J256-J260
Abstract
The authors deposited iridium tantalum oxide thin films using the reactive cosputtering system. The prepared IrTaOx thin films were characterized using X-ray photoelectron spectroscopy, transmission electron microscopy, chronocoloumetry, in situ transmittance measurements, and electrochemical impedance spectroscopy. The oxidized iridium in IrTaOx was increased by increasing the composition of tantalum. Most of IrTaOx thin films have high transmittance modulation, which is attributed by the proton conductivity of tantalum. As a result, the Ir33Ta67 oxide thin film shows a performance of 1.4 s of response time, 5 X 10−9 ㎠/s of ion diffusion coefficient, and 20 ㎠/C of coloration coefficient. The enhanced IrTaOx thin films are expected to be candidate of electrochromic materials for fast response time.
URI
http://pubs.kist.re.kr/handle/201004/37677
ISSN
0013-4651
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE