Improvement of bias stability of indium zinc oxide TFTs by the incorporation of hafnium fabricated by radio-frequency magnetron sputtering

Title
Improvement of bias stability of indium zinc oxide TFTs by the incorporation of hafnium fabricated by radio-frequency magnetron sputtering
Authors
정유진조경철김승한전윤수이상렬
Keywords
oxygen partial pressure; hafnium-doped; indium zinc oxide; bias-stability; Hf
Issue Date
2010-07
Publisher
APCPST 2010
URI
http://pubs.kist.re.kr/handle/201004/37819
Appears in Collections:
KIST Publication > Conference Paper
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