TOF-SIMS depth profiling of deuterated polystyrene-block-poly(n-propyl methacrylate) diblock copolymer films
- TOF-SIMS depth profiling of deuterated polystyrene-block-poly(n-propyl methacrylate) diblock copolymer films
- 이지혜; 윤동환; 신관우; 김강진; 이연희
- time-of-flight; secondary ion mass spectrometry; depth profile; diblock copolymer; microphase separation
- Issue Date
- Surface and interface analysis : SIA
- VOL 42, NO 8, 1409-1416
- Asurface-induced orientationof symmetric,deuteratedpolystyrene/poly(propyl methacrylate)diblock copolymers,dPS-PPrMA
with differentmolecular weights (Mn = 135 000, 119 600, and 75 300) was investigated using time-of-flight secondary ionmass
spectrometry (TOF-SIMS). Elemental depth profiles obtained in the negative ion mode by a Cs+ primary ion beam demonstrate
variations in hydrogen, deuterium, carbon, oxygen, and hydrocarbons within the diblock copolymer according to the depth.
Solution casting films of the copolymers with thicknesses of 700 and 2100 Å exhibited no preferential orientation of the
microdomain morphology with respect to the surface at room temperature. Annealing the copolymer films at 215 ℃ for 4h
produced a dramatic orientation of the microdomains parallel to the surface of the film. This preferential alignment provided
regular oscillation in the composition of both blocks, which continued through the entire film. The periodicity as determined
from a depth profile of TOF-SIMS showed good agreementwith the results of small-angle X-ray scattering. Positive and negative
ion molecular depth profiles by a C60+ cluster ion beam also provide information pertaining to the lower disorder–order
transition (LDOT) behavior of the dPS-PPrMA copolymer. Depth profile results indicate a PPrMA layer preferentially located at
the copolymer/silicon substrate interface. The microdomain separation processes of dPS-PPrMA were investigated as a function
of the annealing temperature and time.
- Appears in Collections:
- KIST Publication > Article
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.