TOF-SIMS depth profiling of deuterated polystyrene-block-poly(n-propyl methacrylate) diblock copolymer films

Title
TOF-SIMS depth profiling of deuterated polystyrene-block-poly(n-propyl methacrylate) diblock copolymer films
Authors
이지혜윤동환신관우김강진이연희
Keywords
time-of-flight; secondary ion mass spectrometry; depth profile; diblock copolymer; microphase separation
Issue Date
2010-08
Publisher
Surface and interface analysis : SIA
Citation
VOL 42, NO 8, 1409-1416
Abstract
Asurface-induced orientationof symmetric,deuteratedpolystyrene/poly(propyl methacrylate)diblock copolymers,dPS-PPrMA with differentmolecular weights (Mn = 135 000, 119 600, and 75 300) was investigated using time-of-flight secondary ionmass spectrometry (TOF-SIMS). Elemental depth profiles obtained in the negative ion mode by a Cs+ primary ion beam demonstrate variations in hydrogen, deuterium, carbon, oxygen, and hydrocarbons within the diblock copolymer according to the depth. Solution casting films of the copolymers with thicknesses of 700 and 2100 Å exhibited no preferential orientation of the microdomain morphology with respect to the surface at room temperature. Annealing the copolymer films at 215 ℃ for 4h produced a dramatic orientation of the microdomains parallel to the surface of the film. This preferential alignment provided regular oscillation in the composition of both blocks, which continued through the entire film. The periodicity as determined from a depth profile of TOF-SIMS showed good agreementwith the results of small-angle X-ray scattering. Positive and negative ion molecular depth profiles by a C60+ cluster ion beam also provide information pertaining to the lower disorder–order transition (LDOT) behavior of the dPS-PPrMA copolymer. Depth profile results indicate a PPrMA layer preferentially located at the copolymer/silicon substrate interface. The microdomain separation processes of dPS-PPrMA were investigated as a function of the annealing temperature and time.
URI
http://pubs.kist.re.kr/handle/201004/38462
ISSN
0142-2421
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KIST Publication > Article
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