Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films
- Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films
- S.M. Pawar; B.S. Pawar; J.H. Kim; 주오심; C.D. Lokhande
- Metal chalcogenides; Thin films; Nanostructures; Metal oxides; Chemical synthesis
- Issue Date
- Current applied physics
- VOL 11, NO 2, 117-161
- Presently nanocrystalline materials have opened a new chapter in the field of electronic applications,
since material properties could be changed by changing the crystallite size and/or thickness of the film.
The synthesis of nanocrystalline metal chalcogenide and metal oxide thin films by chemical bath
deposition (CBD) method is currently attracting considerable attention as it is relatively inexpensive,
simple and convenient for large area deposition. Using CBD and modified CBD (which is also known as
successive ionic layer adsorption and reaction, SILAR) methods, a large number of thin films have been
deposited. This review is on the status of synthesizing thin films of metal chalcogenide and metal oxides
by CBD and SILAR. Properties and applications of the thin films are also summarized.
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