Effect of microstructure on electrical properties of thin film alumina capacitor with metal electrode
- Effect of microstructure on electrical properties of thin film alumina capacitor with metal electrode
- 정명선; 주병권; 오영제; 이전국
- alumina film capacitor; electroless nickel plating; alumina nano structure; palladium; polyethylene glycol
- Issue Date
- 한국재료학회지; Korean Journal of Materials Research
- VOL 21, NO 6, 309-313
- The power capacitors used as vehicle inverters must have a small size, high capacitance, high voltage, fast response
and wide operating temperature. Our thin film capacitor was fabricated by alumina layers as a dielectric material and a metal
electrode instead of a liquid electrolyte in an aluminum electrolytic capacitor. We analyzed the micro structures and the electrical
properties of the thin film capacitors fabricated by nano-channel alumina and metal electrodes. The metal electrode was filled
into the alumina nano-channel by electroless nickel plating with polyethylene glycol and a palladium catalyst. The spherical
metals were formed inside the alumina nano pores. The breakdown voltage and leakage current increased by the chemical reaction
of the alumina layer and PdCl2 solution. The thickness of the electroless plated nickel layer was 300 nm. We observed the nano
pores in the interface between the alumina layer and the metal electrode. The alumina capacitors with nickel electrodes had
a capacitance density of 100 nF/㎠, dielectric loss of 0.01, breakdown voltage of 0.7MV/cm and leakage current of 104 μA.
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