Effects of External Magnetic Fields on the Magnetic Properties of Sputtered Magnetic Thin Films
- Effects of External Magnetic Fields on the Magnetic Properties of Sputtered Magnetic Thin Films
- 안현태; 임상호; 지광구; 한준현
- magnetic thin film; magnetic anisotropy; magnetic field sputtering; finite element method
- Issue Date
- 대한금속 . 재료학회지; Journal of the Korean Institute of Metals and Materials
- VOL 49, NO 6, 505-513
- A magnetic device which enables the application of a strong and uniform magnetic field to thin
film during sputtering was designed for controlling the magnetic anisotropy using a three dimensional finite
element method, and the effects of the external magnetic field on the magnetic properties of sputtered thin
films were investigated. Both the intensity and the uniformity of the magnetic flux density in the sputter zone
(50 mm ×50 mm) was dependent on not only the shape and size of the magnet device but also the magnitude
of stray fields from the magnet. For the magnet device in which the distance between two magnets or two
pure iron bars was 80-90 mm, the magnetic flux density along the direction normal to the external magnetic
field direction was minimum. The two row magnets increased the magnetic flux density and uniformity along
the external magnetic field direction. An Fe thin film sputtered using the optimized magnet device showed
a higher remanence ratio than that fabricated under no external magnetic field.
- Appears in Collections:
- KIST Publication > Article
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.