Effects of External Magnetic Fields on the Magnetic Properties of Sputtered Magnetic Thin Films

Title
Effects of External Magnetic Fields on the Magnetic Properties of Sputtered Magnetic Thin Films
Authors
안현태임상호지광구한준현
Keywords
magnetic thin film; magnetic anisotropy; magnetic field sputtering; finite element method
Issue Date
2011-06
Publisher
대한금속 . 재료학회지; Journal of the Korean Institute of Metals and Materials
Citation
VOL 49, NO 6, 505-513
Abstract
A magnetic device which enables the application of a strong and uniform magnetic field to thin film during sputtering was designed for controlling the magnetic anisotropy using a three dimensional finite element method, and the effects of the external magnetic field on the magnetic properties of sputtered thin films were investigated. Both the intensity and the uniformity of the magnetic flux density in the sputter zone (50 mm ×50 mm) was dependent on not only the shape and size of the magnet device but also the magnitude of stray fields from the magnet. For the magnet device in which the distance between two magnets or two pure iron bars was 80-90 mm, the magnetic flux density along the direction normal to the external magnetic field direction was minimum. The two row magnets increased the magnetic flux density and uniformity along the external magnetic field direction. An Fe thin film sputtered using the optimized magnet device showed a higher remanence ratio than that fabricated under no external magnetic field.
URI
http://pubs.kist.re.kr/handle/201004/40706
ISSN
1738-8228
Appears in Collections:
KIST Publication > Article
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