Growth of Carbon Nanoflakes by Hot Filament Chemical Vapor Deposition System

Title
Growth of Carbon Nanoflakes by Hot Filament Chemical Vapor Deposition System
Authors
Subasa Chandra SahooDipti Ranjan Mohapatra이학주박종극백영준이욱성
Issue Date
2011-10
Publisher
Institute of Electrical and Electronics Engineers Nanotechnology Materials and Devices Conference (IEEE NMDC 2011)
Abstract
Multiwalled carbon nanotubes (MWCNTs) dispersed on Si(100) substrates were treated in CH4/H2/Ar precursor gas mixture in hot filament chemical vapor deposition system without substrate bias. The H2/Ar ratio was varied while the CH4 concentration was fixed at 1%. The chamber pressure and substrate temperature were 7.5 Torr and 800 °C, respectively. In the H2-rich environment almost all MWCNTs were etched away and only a few cauliflower-like structures were grown. By contrast, in the Ar- rich environment, “spongelike” structures consisting of nanoflakes were grown on the entire substrate. A systematic study is under way to analyze the result and the mechanism behind such carbon nanostructure growth.
URI
http://pubs.kist.re.kr/handle/201004/40773
Appears in Collections:
KIST Publication > Conference Paper
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