Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

Title
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing
Authors
손정곤장재범Karl K. BerggrenCaroline A. Ross
Keywords
Block Copolymer; templated self-assembly; Patterning; mixed morphology; solvent annealing; electron beam; cross-linking; polystyrene-b-polydimethylsiloxane; nanolithography
Issue Date
2011-11
Publisher
Nano letters
Citation
VOL 11, NO 11, 5079-5084
Abstract
Block copolymer self-assembly generates patterns with periodicity in the ~10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined by the molecular architecture, and considerable research has been carried out to extend the range of patterns that can be produced from a given block copolymer, but the ability to control the period of the pattern over a wide range and to achieve complex structures with mixed morphologies from a given block copolymer is limited. Here we show how patterns consisting of coexisting sub-10-nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of poly(styrene-block-dimethylsiloxane). These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film.
URI
http://pubs.kist.re.kr/handle/201004/41422
ISSN
1530-6984
Appears in Collections:
KIST Publication > Article
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