The Deposition behavior of SiC:H films deposited using a remote PECVD system with an HMDS precursor and C2H2 dilution gas

Title
The Deposition behavior of SiC:H films deposited using a remote PECVD system with an HMDS precursor and C2H2 dilution gas
Authors
Cho, Sung HyukLee Young Jin최두진김태송
Keywords
SiC:H; RPE-CVD; HMDS; plasma
Issue Date
2007-12
Publisher
Journal of ceramic processing research / International organization for ceramic processing
Citation
VOL 8, NO 6, 393-396
URI
http://pubs.kist.re.kr/handle/201004/41643
ISSN
1229-9162
Appears in Collections:
KIST Publication > Article
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