Investigation of Microphase Separation of PS-PPrMA Diblock Copolymer Films by Time-of-Flight Secondary Ion Mass Spectrometry
- Investigation of Microphase Separation of PS-PPrMA Diblock Copolymer Films by Time-of-Flight Secondary Ion Mass Spectrometry
- 이연희; 이지혜; 임원철; 신관우
- microphase; separation; PS-PPrMA; diblock; copolymer; ToF; SIMS
- Issue Date
- 5th International Symposium on Practical Surface Analysis
- , 97-97
- Block copolymers show nanoscale self-assembly behavior to generate microscopically ordered structure known as microphases. In the microphase-separated state, diblock copolymers can exhibit the copolymer. The microphase separation of diblock copolymers has been investigated by many different research groups for many years, because of the increasing use of diblock copolymer as compatibilizers, dispersants, impact modifiers, nanocarriers, and templates.[1-3] In this presentation produced after annealing thin polymer films. We report on the characterization of the morphology from symmetric diblock copolymers of polystyrene-b-poly(n-propy1 methacrylate)(PS-PPrMA), where PS block was perdeuterated, using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and Atomic Force Microscopy (AFM). TOF-SUMS depth profiling was obtained for the lamellar morphology of deuterated PS-PPrMA which is found to orient parallel to the surface of the substrate. This preferential orientation resulted in a periodic variation in the composition of each block that continued through the entire copolymer film. Time- and temperature-dependent annealing studies on dPS-PPrMA thin film on the silicon substrates were performed to investigate the lower critical ordering transition (LCOT) properties of diblock copolymer. AFM is also used to visualize the surface topography.
- Appears in Collections:
- KIST Publication > Conference Paper
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.