Investigation of Microphase Separation of PS-PPrMA Diblock Copolymer Films by Time-of-Flight Secondary Ion Mass Spectrometry

Title
Investigation of Microphase Separation of PS-PPrMA Diblock Copolymer Films by Time-of-Flight Secondary Ion Mass Spectrometry
Authors
이연희이지혜임원철신관우
Keywords
microphase; separation; PS-PPrMA; diblock; copolymer; ToF; SIMS
Issue Date
2010-10
Publisher
5th International Symposium on Practical Surface Analysis
Citation
, 97-97
Abstract
Block copolymers show nanoscale self-assembly behavior to generate microscopically ordered structure known as microphases. In the microphase-separated state, diblock copolymers can exhibit the copolymer. The microphase separation of diblock copolymers has been investigated by many different research groups for many years, because of the increasing use of diblock copolymer as compatibilizers, dispersants, impact modifiers, nanocarriers, and templates.[1-3] In this presentation produced after annealing thin polymer films. We report on the characterization of the morphology from symmetric diblock copolymers of polystyrene-b-poly(n-propy1 methacrylate)(PS-PPrMA), where PS block was perdeuterated, using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and Atomic Force Microscopy (AFM). TOF-SUMS depth profiling was obtained for the lamellar morphology of deuterated PS-PPrMA which is found to orient parallel to the surface of the substrate. This preferential orientation resulted in a periodic variation in the composition of each block that continued through the entire copolymer film. Time- and temperature-dependent annealing studies on dPS-PPrMA thin film on the silicon substrates were performed to investigate the lower critical ordering transition (LCOT) properties of diblock copolymer. AFM is also used to visualize the surface topography.
URI
http://pubs.kist.re.kr/handle/201004/41747
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