Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
- Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
- 장재범; 손정곤; Adam F. Hannon; Alfredo Alexander-Katz; Caroline A. Ross; Karl K. Berggren
- block copolymer; self-assembly; nanolithography; line pattern; high throughput; templated self-assembly
- Issue Date
- ACS Nano
- VOL 6, NO 3, 2071-2077
- Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the selfassembly
needs to be templated to impose long-range order and to control pattern
registration with other substrate features. We demonstrate here the fabrication of aligned
sub-10-nm line width patterns with a controlled orientation by using lithographically formed
post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS)
diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by
varying the spacing and geometry of the posts, and the results were modeled using 3D selfconsistent
field theory. This work illustrates how arrays of narrow lines with specific in-plane
orientation can be produced, and how the post height and diameter affect the self-assembly.
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