Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays

Title
Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
Authors
장재범손정곤Adam F. HannonAlfredo Alexander-KatzCaroline A. RossKarl K. Berggren
Keywords
block copolymer; self-assembly; nanolithography; line pattern; high throughput; templated self-assembly
Issue Date
2012-03
Publisher
ACS Nano
Citation
VOL 6, NO 3, 2071-2077
Abstract
Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the selfassembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D selfconsistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
URI
http://pubs.kist.re.kr/handle/201004/42166
ISSN
19360851
Appears in Collections:
KIST Publication > Article
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