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dc.contributor.author장재범-
dc.contributor.author손정곤-
dc.contributor.authorAdam F. Hannon-
dc.contributor.authorAlfredo Alexander-Katz-
dc.contributor.authorCaroline A. Ross-
dc.contributor.authorKarl K. Berggren-
dc.date.accessioned2015-12-03T00:46:52Z-
dc.date.available2015-12-03T00:46:52Z-
dc.date.issued201203-
dc.identifier.citationVOL 6, NO 3, 2071-2077-
dc.identifier.issn19360851-
dc.identifier.other37011-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/42166-
dc.description.abstractSelf-assembly of block copolymer films can generate useful periodic nanopatterns, but the selfassembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D selfconsistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.-
dc.publisherACS Nano-
dc.subjectblock copolymer-
dc.subjectself-assembly-
dc.subjectnanolithography-
dc.subjectline pattern-
dc.subjecthigh throughput-
dc.subjecttemplated self-assembly-
dc.titleAligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays-
dc.typeArticle-
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