Study on the thermal stability of ordered mesoporous SiO2 film for thermal insulating film

Title
Study on the thermal stability of ordered mesoporous SiO2 film for thermal insulating film
Authors
하태정박형호장호원윤석진신상우조형희
Keywords
Ordered mesoporous SiO2 film; Thermal stability; Pore ordering; Mechanical property; Thermal conductivity
Issue Date
2012-08
Publisher
Microporous and mesoporous materials
Citation
VOL 158, 123-128
Abstract
Ordered mesoporous SiO2 film has very low thermal conductivity compared to dense SiO2 film due to the presence of nanometer-sized pores. In order to apply this excellent material to thermal insulation fields, it is important to ensure the thermal stability of the pore structure at high temperature as well as thermal conductivity. In this study, ordered mesoporous SiO2 films were synthesized with various amounts of surfactant, and heat treatment at various temperatures was conducted with the synthesized films to confirm their thermal stabilities. Pore structure degradation of the mesoporous SiO2 film was observed with increasing temperature of the heat treatment as measured by grazing incidence small angle X-ray scattering. However, mesoporous SiO2 films with highly-ordered pore arrangements showed enhanced thermal stability and maintained their pore structures during additional heat treatment at higher temperatures. The mechanical properties and thermal conductivity of the ordered mesoporous SiO2 films with thermal stability at high temperature were analyzed.
URI
http://pubs.kist.re.kr/handle/201004/42711
ISSN
13871811
Appears in Collections:
KIST Publication > Article
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