Enhanced Light Output from the Nano-Patterned InP Semiconductor Substrate Through the Nanoporous Alumina Mask

Title
Enhanced Light Output from the Nano-Patterned InP Semiconductor Substrate Through the Nanoporous Alumina Mask
Authors
정미김재헌이석Byung Jin JangWoo Young LeeYoo-Mi OhSun-Woo Park우덕하
Keywords
Nano-Pattern; Nanoporous Alumina Mask; LIght enhancement; InP Nanohole; Photoluminescence; Light Output Efficiency
Issue Date
2012-07
Publisher
Journal of nanoscience and nanotechnology
Citation
VOL 12, NO 7, 5747-5753
Abstract
A significant enhancement in the light output from nano-patterned InP substrate covered with a nanoporous alumina mask was observed. A uniform nanohole array on an InP semiconductor substrate was fabricated by inductively coupled plasma reactive ion etching (ICP-RIE), using the nanoporous alumina mask as a shadow mask. The light output property of the semiconductor substrate was investigated via photoluminescence (PL) intensity measurement. The InP substrate with a nanohole array showed a more enhanced PL intensity compared with the raw InP substrate without a nanohole structure. After ICP-RIE etching, the light output from the nanoporous InP substrate covered with a nanoporous alumina mask showed fourfold enhanced PL intensity compared with the raw InP substrate. These results can be used as a prospective method for increasing the light output efficiency of optoelectronic devices.
URI
http://pubs.kist.re.kr/handle/201004/42891
ISSN
15334880
Appears in Collections:
KIST Publication > Article
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE