Enhanced Light Output from the Nano-Patterned InP Semiconductor Substrate Through the Nanoporous Alumina Mask
- Enhanced Light Output from the Nano-Patterned InP Semiconductor Substrate Through the Nanoporous Alumina Mask
- 정미; 김재헌; 이석; Byung Jin Jang; Woo Young Lee; Yoo-Mi Oh; Sun-Woo Park; 우덕하
- Nano-Pattern; Nanoporous Alumina Mask; LIght enhancement; InP Nanohole; Photoluminescence; Light Output Efficiency
- Issue Date
- Journal of nanoscience and nanotechnology
- VOL 12, NO 7, 5747-5753
- A significant enhancement in the light output from nano-patterned InP substrate covered with a
nanoporous alumina mask was observed. A uniform nanohole array on an InP semiconductor
substrate was fabricated by inductively coupled plasma reactive ion etching (ICP-RIE), using the
nanoporous alumina mask as a shadow mask. The light output property of the semiconductor substrate
was investigated via photoluminescence (PL) intensity measurement. The InP substrate with
a nanohole array showed a more enhanced PL intensity compared with the raw InP substrate without
a nanohole structure. After ICP-RIE etching, the light output from the nanoporous InP substrate
covered with a nanoporous alumina mask showed fourfold enhanced PL intensity compared with
the raw InP substrate. These results can be used as a prospective method for increasing the light
output efficiency of optoelectronic devices.
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