Three-Dimensional Dual-Porous Structure Developed by Preferential/Stain Etching on Grind-Damaged (001) Si: Formation and Optical Properties

Title
Three-Dimensional Dual-Porous Structure Developed by Preferential/Stain Etching on Grind-Damaged (001) Si: Formation and Optical Properties
Authors
우태기김성일김은경안효석
Keywords
etching; silicon; optical property; grind-damage
Issue Date
2012-01
Publisher
Journal of the Electrochemical Society
Citation
VOL 159, NO 1, P1-P7
Abstract
The dual-porous-structure (DPS) consisting of the amorphous porous structure (APS) and the defect-followed mesoporous structure (DMPS) was created using a new method combining the preferential etching and the stain etching on a grind damaged (001) silicon wafer. In this article, this novel pore-structuring technology, utilizing prominent reactivity of the intentional defect site produced by grind process, is introduced, and its procedures and the structural behaviors of the DPS are described by atomic force microscopy, transmission electron microscopy, scanning electron microscopy and 3D-profiling. Analysis of the optical properties proves that the broad photoluminescence intensity exists in the whole visible spectral range, and the light trapping functions of the antireflective coating and surface texture come from the APS and the DMPS, respectively. We also attempt to discuss about the absorption edge shift to the NIR spectral region using oblique angle of the DMPS. This original defect engineering approach is situated on viability of a rapid large area pore-structuring technology, and the optical properties were experimentally described for the first time.
URI
http://pubs.kist.re.kr/handle/201004/42928
ISSN
00134651
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KIST Publication > Article
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