Thickness dependent surface microstructure evolution of bismuth thin film prepared by molecular beam deposition method
- Thickness dependent surface microstructure evolution of bismuth thin film prepared by molecular beam deposition method
- 안영근; 김영환; 김성일; 정광호
- micro structure; thin film; MBE; Bismuth thin film; Thickness dependent surface; microstructure evolution; Evolutionary selection model; Molecular beam deposition
- Issue Date
- Current applied physics
- VOL 12, NO 6, 1518-1522
- The evolution of surface microstructure on bismuth thin film deposited by molecular beam deposition
method is investigated. Morphological, topographical, structural, and electrical property changes of the
film with various thicknesses are studied by means of AFM, XRD, XRR, and 4-point probe. Drastic change
of surface grain in shape, which transforms from round shape to polyhedral shape, is detected around
13-18 nm film thickness. Abrupt horizontal profile change of surface grain is verified with power
spectral density (PSD) function. At this threshold thickness, the film shows very low roughness value
and surface area ratio. Then both increase steeply as the film thickness surpasses the thickness. As the
bismuth film is deposited thicker, it has textured structure and high roughness on surface. With
increment of the thickness, the electrical sheet resistance of the films is significantly decreased. We
explain this surface microstructure evolution on the bismuth film with the evolutionary selection model.
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