Top-down Meets Bottom up:Block Copolymers with Photoreactive Segments

Title
Top-down Meets Bottom up:Block Copolymers with Photoreactive Segments
Authors
Rina MaedaMichelle Chavis유남호Christopher K. Ober
Keywords
self-assembly; patternable block copolymer; lithography; nanopattern; photoresist
Issue Date
2012-02
Publisher
Journal of photopolymer science and technology; [Fotoporimā Konwakai shi]
Citation
VOL 25, NO 1, 17-20
Abstract
The fluorine-containing block copolymers of poly(styrene-block-2,2,2-trifluoroethyl methacrylate) (PS-b-PTFEMA) and poly(4-hydroxystyrene-block-2,2,2-trifluoroethyl methacrylate) (PHOST-b-PTFEMA), which both are capable of both top-down and bottom-up lithography were developed. These block copolymers were synthesized by either anionic or ATRP living polymerization methods. Comparison is made to patternable block copolymers of poly(hydroxystyrene-block-α-methyl styrene) (PHOST-b-PAMS) and poly(hydroxyethyl methacrylate)-block-poly(methyl methacrylate) (PHEMA-b-PMMA). Thin films of the block copolymers were subjected to lithographic processing using e-beam and DUV radiation combined with vacuum processing to create integrated patterns such as dots in lines. Solvent annealing was used to create long range order.
URI
http://pubs.kist.re.kr/handle/201004/42949
ISSN
09149244
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KIST Publication > Article
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