Morphology Control in Block Copolymer Films using Mixed Solvent Vapors

Title
Morphology Control in Block Copolymer Films using Mixed Solvent Vapors
Authors
Kevin GotrikAdam Hannon손정곤Brent KellerA. Alexander-KatzCaroline A. Ross
Keywords
block copolymer; solvent vapor annealing; self-assembly; ps-pdms; toluene; heptane; self-consistent field theory
Issue Date
2012-09
Publisher
ACS Nano
Citation
VOL 6, NO 9, 8052-8059
Abstract
Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyreneblock- polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.
URI
http://pubs.kist.re.kr/handle/201004/43284
ISSN
19360851
Appears in Collections:
KIST Publication > Article
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