Morphology Control in Block Copolymer Films using Mixed Solvent Vapors
- Morphology Control in Block Copolymer Films using Mixed Solvent Vapors
- Kevin Gotrik; Adam Hannon; 손정곤; Brent Keller; A. Alexander-Katz; Caroline A. Ross
- block copolymer; solvent vapor annealing; self-assembly; ps-pdms; toluene; heptane; self-consistent field theory
- Issue Date
- ACS Nano
- VOL 6, NO 9, 8052-8059
- Solvent vapor annealing of block copolymer thin films can produce a range of morphologies
different from the equilibrium bulk morphology. By systematically varying the flow rate of two
different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the
morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyreneblock-
polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology
was correlated with the swelling of the block copolymer and homopolymer films and the
solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of
solvent swelling. These results provide a framework for predicting the range of morphologies
available under different solvent vapor conditions, which is important in lithographic applications
where precise control of morphology and critical dimensions are essential.
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