Thermal Reaction of Allyl Chloride with Trichlorosilane And Their Mechanistic Aspects

Title
Thermal Reaction of Allyl Chloride with Trichlorosilane And Their Mechanistic Aspects
Authors
정영애한준수유복렬Youn kyung kang
Issue Date
2012-10
Publisher
대한화학회 추계 학술대회
Abstract
Trichlorosilane undergoes a variety of interesting and useful Si-C bond formation reactions with unsaturated organic compounds to give various organosilanes containing Si-Cl bonds as functionalities, which are used as important starting materials in the silicones industry. Thermal reaction of allyl chloride with trichlrosilane was studied without catalyst at temperatures ranging from 150 to 250℃. In the reaction, the hydrosilylation reaction rate increases as the reaction temperature increases. These thermal reactions afforded a variety of Si-C coupling products such as allyltirichlorosilane, trichloro(3-chloropropyl)silane, 1,3-bis(trichlorosilyl)propane, (2-(3-(trichlorosilyl)propyl)propane-1,3-diyl)bis(trichlorosilane) and (2-(5-(trichlorosilyl)-2- (trichlorosilylmethyl)pentyl)propane-1,3-diyl)bis(trichlorosilane). Thermal Si-C coupling reaction of chloropropane with trichlorosilane in order to investigate the its mechanism. The thermal reaction of chloropropane with trichlorosilane took place to give Si-C coupling products such as trichloropropane, tetrachlorosilane, etc. It was confirmed that relatively less activated C-Cl bond of chloropropane was decomposed our thermal conditions. In these thermal reactions, it seems likely that the thermal reaction of allyl compounds with trichlorosilane was involved in radical process.
URI
http://pubs.kist.re.kr/handle/201004/43302
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KIST Publication > Conference Paper
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