Thermal Reaction of Allyl Chloride with Trichlorosilane And Their Mechanistic Aspects
- Thermal Reaction of Allyl Chloride with Trichlorosilane And Their Mechanistic Aspects
- 정영애; 한준수; 유복렬; Youn kyung kang
- Issue Date
- 대한화학회 추계 학술대회
- Trichlorosilane undergoes a variety of interesting and useful Si-C bond formation reactions with unsaturated organic compounds to give various organosilanes containing Si-Cl bonds as
functionalities, which are used as important starting materials in the silicones industry. Thermal reaction of allyl chloride with trichlrosilane was studied without catalyst at temperatures
ranging from 150 to 250℃. In the reaction, the hydrosilylation reaction rate increases as the reaction temperature increases. These thermal reactions afforded a variety of Si-C coupling
products such as allyltirichlorosilane, trichloro(3-chloropropyl)silane, 1,3-bis(trichlorosilyl)propane, (2-(3-(trichlorosilyl)propyl)propane-1,3-diyl)bis(trichlorosilane) and (2-(5-(trichlorosilyl)-2-
(trichlorosilylmethyl)pentyl)propane-1,3-diyl)bis(trichlorosilane). Thermal Si-C coupling reaction of chloropropane with trichlorosilane in order to investigate the its mechanism. The thermal
reaction of chloropropane with trichlorosilane took place to give Si-C coupling products such as trichloropropane, tetrachlorosilane, etc. It was confirmed that relatively less activated C-Cl
bond of chloropropane was decomposed our thermal conditions. In these thermal reactions, it seems likely that the thermal reaction of allyl compounds with trichlorosilane was involved
in radical process.
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