Gasochromic Performance of WO3-nanorod Thin Films Fabricated with an ArF Excimer Laser
- Gasochromic Performance of WO3-nanorod Thin Films Fabricated with an ArF Excimer Laser
- M. H. Yaacob; J. Z. Ou; W. Wlodarski; C. S. Kim; J. Y. Lee; 김영환; C. M. Oh; K. P. Dhakal; J. Y. Kim; J. H. Kang
- Gasochromic; Oxide; Nanorod; Sensor; Semiconductor
- Issue Date
- Journal of the Korean Physical Society
- VOL 60, NO 3, 393-397
- Thin films with tungsten trioxide (WO3) nanorods were fabricated by using an ArF pulsed laser
deposition system. Because the ArF excimer laser operates at a very short wavelength of 193 nm,
short enough to expect strong absorption of the photons in the semiconductor oxide targets, and
because the clusters incoming to the substrates have high momentum, we could build thin films with
good surface morphology. Highly homogeneous arrays of nanorods with sizes mostly in the range of
30 – 40 nm were observed. The absorbance response towards hydrogen (H2) gas was investigated
for a WO3 film coated with 25-˚A-thick palladium (Pd). The Pd/WO3-nanorod thin films exhibited
excellent gasochromic response when measured in the visible-NIR range (400 – 1000 nm). As low
as 0.06% H2 concentration was clearly sensed. A significant reversible absorbance change and fast
recovery (<2 min) were observed when the films were exposed to H2 at different concentrations.
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